Effect of deposition rate and thickness on the structural and electrical properties of evaporated Ni/glass and N/Si (1 0 0) thin films

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dc.contributor.authorBenabbas, Abderrahim
dc.date.accessioned2020-10-18T09:31:39Z
dc.date.available2020-10-18T09:31:39Z
dc.date.issued2008-12-01
dc.identifier.urihttp://172.16.99.83:4000/handle/123456789/9159
dc.language.isoenen_US
dc.publisherUniversité Akli Mouhand Oulhadj-Bouiraen_US
dc.titleEffect of deposition rate and thickness on the structural and electrical properties of evaporated Ni/glass and N/Si (1 0 0) thin filmsen_US
dc.typeArticleen_US

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