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Effect of deposition rate and thickness on the structural and electrical properties of evaporated Ni/glass and N/Si (1 0 0) thin films
Effect of deposition rate and thickness on the structural and electrical properties of evaporated Ni/glass and N/Si (1 0 0) thin films
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Effect of deposition rate and thickness on the structural and electrical properties of evaporated Ni.pdf
(247.85 KB)
Date
2008-12-01
Authors
Benabbas, Abderrahim
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Université Akli Mouhand Oulhadj-Bouira
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http://172.16.99.83:4000/handle/123456789/9159
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